个人信息：
基本信息：胡连军、男、副教授、信息工程学院
教育背景：2018-09至2022-06 河北工业大学 电子科学与技术 博士
联系方式：hulianjun@tjcu.edu.cn
学科领域：
主要从事医学图像处理、芯片缺陷检测和深度学习等方面的研究。
代表性论文：
1. Hu Lianjun*, Sun Qian, Hou Shuping, et al. Multicomponent protection at metal/oxide interfaces: electron-atomic scale mechanism of TT-LYK inhibitor in cobalt chemical mechanical polishing. Langmuir,2025.
2. Hu Lianjun*, Sun Wenhui, Liu Lingling, et al. The corrosion inhibition performance and mechanism of α-benzoin oxime on copper: A comprehensive study of experiments and DFT calculations[J]. Colloids and Surfaces A,2024, 700: 134832.
3. Hu Lianjun*, Chen Qi, Fang Qi, et al. Investigation of the inhibition properties and mechanism of salicylaldoxime for copper corrosion via experimental and theoretical methods[J]. Materials Science in Semiconductor Processing, 2024, 173: 108141.
4. Hu Lianjun*, Chen Qi, He Jiting, et al. Experimental and computational investigation of salicylhydroxamic acid as a corrosion inhibitor for copper in alkaline solutions[J]. ECS Journal of Solid State Science and Technology, 2024, 13: 094002.
5. Hu Lianjun*, Pan Guofeng, Chen Qi, et al. Experimental and computational investigation of complexing agents on copper dissolution for chemical mechanical polishing process[J]. Colloids and Surfaces A, 2023, 664: 131142.
6. Hu Lianjun*, Zhang Xinbo, Wang Hao, et al. Experimental and density functional theory study of complexing agents on cobalt dissolution in alkaline solutions[J]. Electrochimica Acta, 2021, 375: 137977.
7. Hu Lianjun*, Pan Guofeng, Wang Hao, et al. The synergistic inhibitory effect and density functional theory study of 2,2’- [[(Methyl-1H-benzotriazol-1-yl)methyl]imino]bisethanol and potassium oleate on copper in H2O2 based alkaline slurries[J]. Colloids and Surfaces A, 2020, 603: 125275.
8. Hu Lianjun*, Pan Guofeng, Wang Hao, et al. The synergy and DFT study of TT-LYK and potassium oleate on chemical mechanical polishing of cobalt in alkaline medium[J]. Materials Chemistry and Physics, 2020, 256: 123672.
9. Hu Lianjun*, Pan Guofeng, Li Can,et al. Potassium tartrate as a complexing agent for chemical mechanical polishing of Cu/Co/TaN barrier liner stack in H2O2 based alkaline slurries[J]. Materials Science in Semiconductor Processing, 2020, 108: 104883.
10. Hu Lianjun*, Pan Guofeng, Xu Yi, et al. The effect of hydroxyethylidene diphosphonic acid on the chemical mechanical polishing of cobalt in H2O2 based alkaline slurries[J]. ECS Journal of Solid State Science and Technology, 2020, 9(3): 034007.
11. Hu Lianjun*, Pan Guofeng, Zhang Xinbo, et al. Inhibition effect of TT-LYK on Cu corrosion and galvanic corrosion between Cu and Co during CMP in alkaline slurry[J]. ECS Journal of Solid State Science and Technology, 2019, 8(8): P437-P447.
12. 胡连军, 刘建军, 潘国峰*,等. 钴化学机械抛光的研究进 展[J].材料导报, 2022, 36(04): 189-198.
科研项目：
1. 国家自然科学基金委，国家自然科学基金专项项目, 62441405，集成电路亚10nm节点钴互连钴膜CMP及其化学腐蚀抑制机理研究, 2025-01至2025-12, 9.25万元, 结题, 主持。
2. 天津市科学技术局, 天津市青年基金, 23JCQNJC00840, 基于计算化学的集成电路钴基阻挡层CMP及电偶腐蚀抑制机理研究, 2023-10 至 2025-09, 6万元, 结题, 主持。
获奖成果：
胡连军(4/5); 高端芯片新型互连金属化学机械抛光的腐蚀与表面调控机理, 中国腐蚀与防护学会, 自然科学, 省部一等奖, 2026（程洁; 张力飞; 潘国峰; 胡连军; 路新）.
其他（如专利等）
1.刘玲玲;胡连军;杨惠兰;张亚坤;吴阳.低开关电压应力的双开关高升压直流变换器.授权发明专利号：ZL202310444929.2.
2.张昂;刘林;刘玲玲;吴阳;张亚坤;胡连军.应用于农业自动化浇灌设备的监测运维系统.授权发明专利号：ZL202411922855.X.
